ZrCoRE (RE denotes rare earth elements) non-evaporable getter films have significant applications in vacuum packaging of micro electro mechanical system devices because of their excellent gas adsorption performance, low activation temperature and environmental friendliness. The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures. The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated. Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries. The increase in Ar pressure results in more grain boundaries and gap structures in the films. In contrast, films deposited in Kr display a higher density of grain boundaries and cluster structures, and the films have an obvious columnar crystal structure, with numerous interfaces and gaps distributed between the columnar structures, providing more paths for gas diffusion. As Kr pressure increases, the film demonstrates more pronounced continuous columnar structure growth, accompanied by deeper and wider grain boundaries. This structural configuration provides a larger specific surface area, which significantly improves the hydrogen adsorption speed and capacity. Consequently, high Ar and Kr pressures are beneficial to improve the adsorption performance.