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W/Mo纳米多层膜的界面结构与超硬效应
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TB383 O484

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A Study on the Interface Microstructure and Superhardness Effect of W/Mo Multilayer
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    摘要:

    研究了W/Mo纳米多层膜的微结构及超硬效应,W/Mo纳米多层膜采用磁控溅射技术制备,并采用XRD、TEM和显微硬度计研究了薄膜的微结构和硬度。结果表明,W/Mo纳米多层膜形成多晶外延生长的超晶格结构,界面共格畸变使W/Mo两调制层的晶面间距随调制周期的减小而相互接近,在多层膜中形成交变应力场,从而使薄膜得到强化。

    Abstract:

    The interface microstructure and su perhardness effect of W/Mo nano -mul tilayers have been studied.The W/Mo multilayers were synthesized with magnetron sputtering technique and their microstructure and hardness were characterized by XRD,TEM,HREM,and mi-croindenter,respectively.The results show that the W/Mo multilayers h ave a epitaxially grown mode and got polycrystal superlattices.With the decrease of modulation period of multilayers,the interplanar dista nces of Wand Mo layers are close to eac h other resulting from coherent strain on the interface,which produces an alternating stress field and s trengthens multilayers.

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李戈扬 韩增虎 等. W/Mo纳米多层膜的界面结构与超硬效应[J].稀有金属材料与工程,2003,(1):1~4.[Li Geyang, Han Zenghu, Tian Jiawan, Zhang Liuqing, Gu Mingyuan. A Study on the Interface Microstructure and Superhardness Effect of W/Mo Multilayer[J]. Rare Metal Materials and Engineering,2003,(1):1~4.]
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  • 最后修改日期:2001-05-29
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