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磁控溅射Zr-Ti薄膜的组织结构与血液相容性
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教育部新世纪优秀人才支持计划(NCET-06-0464);江苏省自然科学基金(BK2007515)


Microstructure and Blood Compatibility of Zr-Ti Film Depositedby Magnetron Sputtering
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    摘要:

    通过直流平衡磁控溅射法在NiTi SMA表面生成Zr-Ti膜,用SEM、XRD和XPS分析证实制备的Zr-Ti膜呈现晶带T型结构,组织保持了细小致密的纤维状特征,与基底结合良好,并且出现了少量生物惰性ZrO2和TiO2陶瓷相。通过测定溶血率研究血小板黏附行为,评估血液相容性。结果表明,与NiTi基底相比,Zr-Ti膜的溶血率更低,表面黏附的血小板数量减少,能够改善NiTi SMA基底的血液相容性。最后,对磁控溅射沉积Zr-Ti膜的成膜机理进行了探讨

    Abstract:

    Zr-Ti film was deposited on the surface of NiTi shape memory alloy (SMA) by balanced magnetron DC sputtering. The results of SEM, XRD and XPS indicate that the Zr-Ti film has the T-type crystal band structure with a fine and dense fibre character. The film has a good combination with NiTi substrate and a small amount of bioinert ZrO2 and TiO2 ceramics phases is found in the film. Blood compatibility was evaluated by hemolysis test and platelet adhesion test. The hemolysis of Zr-Ti film is less than that of NiTi SMA. And the number of platelets on the sample surface is also less than that of Zr-Ti film, which indicates the blood compatibility of NiTi SMA could be improved by the Zr-Ti film. Finally the depositing mechanism of the Zr-Ti film by magnetron sputtering was discussed

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余凤丹,储成林,吉宏林,饶 席,张文艳,董寅生,郭 超,盛晓波,林萍华,朱剑豪.磁控溅射Zr-Ti薄膜的组织结构与血液相容性[J].稀有金属材料与工程,2011,40(3):483~486.[Yu Fengdan, Chu Chenglin, Ji Honglin, Rao Xi, Zhang Wenyan, Dong Yinsheng, Guo Chao, Sheng Xiaobo, Lin Pinghua, Paul K. Chu. Microstructure and Blood Compatibility of Zr-Ti Film Depositedby Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2011,40(3):483~486.]
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  • 收稿日期:2010-03-25
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