+高级检索
硫酸甲醇体系中电解抛光钽的实验研究
DOI:
作者:
作者单位:

作者简介:

通讯作者:

中图分类号:

基金项目:


Experimental Study on Electropolishing of Tantalum in Sulfuric Acid-methanol
Author:
Affiliation:

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
  • |
  • 文章评论
    摘要:

    采用硫酸甲醇体系对钽进行电解抛光,并对其抛光性能进行了研究,测定了不同配比时电解液中钽的阳极极化曲线,研究了电解液配比和电压对钽表面质量的影响。在搅拌速率为16 m/s、电解液温度为0 ℃、时间为3 min、硫酸甲醇体积比为1:7时,电压在20 V左右抛光效果较好、钽表面均方根粗糙度Rq小于30 nm,不仅能够满足钽材表面精饰加工需求,而且能够满足EOS靶用标准材料薄膜对表面质量要求。

    Abstract:

    Sulfuric acid-methanol electrolytes were applied for the electropolishing of tantalum. The effects of electrolyte composition and voltage on the finish quality of tantalum were investigated. The optimum parameters for polishing tantalum are determined as follows: V(H2SO4):V(CH3OH) =1:7, voltage=~20 V when the stir speed is 16 m/s, and the electrolysis time is 3 min at 0 oC. The results show that RMS Rq of the polished tantalum is less than 30 nm and the requirement of tantalum surface and EOS thin film can be satisfied.

    参考文献
    相似文献
    引证文献
引用本文

张运娟,邢丕峰,韦建军,李朝阳,张淑洋.硫酸甲醇体系中电解抛光钽的实验研究[J].稀有金属材料与工程,2011,40(12):2184~2187.[Zhang Yunjuan, Xing Pifeng, Wei Jianjun, Li Chaoyang, Zhang Shuyang. Experimental Study on Electropolishing of Tantalum in Sulfuric Acid-methanol[J]. Rare Metal Materials and Engineering,2011,40(12):2184~2187.]
DOI:[doi]

复制
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
  • 引用次数:
历史
  • 收稿日期:2010-12-19
  • 最后修改日期:
  • 录用日期:
  • 在线发布日期:
  • 出版日期: