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AZ31镁合金在化学镀镀液中的电化学行为研究
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江苏高校优势学科建设工程资助项目


Electrochemical Behavior of AZ31 Wrought Magnesium Alloy in the Solution
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    摘要:

    采用混合电位-时间曲线、极化曲线和电化学阻抗谱,研究经不同浓度氢氟酸活化处理后的AZ31变形镁合金在化学镀镀液中的电化学行为,并通过扫描电子显微镜(SEM)观察AZ31活化前后的形貌变化。结果表明,经活化的试样在化学镀过程中被镀层完全覆盖,所用时间随着氢氟酸浓度的增加而延长;镀液中的镍离子被还原的起始电位随着氢氟酸浓度的增加而向正偏移;电极/镀液界面反应的电荷转移电阻随着氢氟酸浓度的增加而增大,并且电极/镀液界面反应是化学镀初始沉积期的控制步骤;AZ31镁合金基体中的Mn-Al相在氢氟酸活化过程中的颗粒脱落是导致氟化膜产生缺陷的主要原因,氢氟酸浓度越高,氟化膜缺陷越少。

    Abstract:

    Electrochemical behavior of AZ31 wrought magnesium alloy activated by hydrofluoric acid (HF) of different concentration was studied in an electroless nickel plating bath, using mixed potential-time curves, polarization curves and electrochemical impedance spectrum. Changes of morphologies of AZ31 samples before and after the HF activation were observed by scanning electron microscopy (SEM). The results show that the time in which the activated samples were coated completely by Ni-P layers extends with the increase of the concentration of HF. The onset reduction potential of Ni2+ in the plating bath shifts toward positive direction with an increase in the concentration of HF. The charge transfer resistance of electrode/bath interface reaction increases with an increase in the concentration of HF, and the interface reaction between the electrode and the bath is the rate-controlling step during the initial deposition stage. The shedding of Mn-Al particles in the AZ31 magnesium alloy matrix during the HF activation process results in the defect formation of the fluoride film, and the higher concentration of HF, the less defect formed on the fluoride film.

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秦铁男,马立群,姚 妍,解 瑞,丁 毅. AZ31镁合金在化学镀镀液中的电化学行为研究[J].稀有金属材料与工程,2012,41(9):1586~1591.[Qin Tienan, Ma Liqun, Yao Yan, Xie Rui, Ding Yi. Electrochemical Behavior of AZ31 Wrought Magnesium Alloy in the Solution[J]. Rare Metal Materials and Engineering,2012,41(9):1586~1591.]
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  • 收稿日期:2011-09-10
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