The volt-ampere characteristics of gas discharge was introduced form positive-Ohm of magnetron sputtering ion plating into anti-Ohm section using pulse mode and deposited TiN films under different target current density. The influences of positive-Ohm and anti-Ohm sections on the microstructure and properties of the films were studied. The results indicated that in the anti-Ohm section with target current density (Itd) is more than 0.2A?cm-2, the films have good surface quality and density degree, and the hardness and membrane-binding strength were upgraded from 18.9GPa、4.5N in positive-Ohm section (Itd=0.11A?cm-2) to 25.8GPa、18N in anti-Ohm section (Itd=0.38 A?cm-2) respectively.