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钒掺杂Cd0.9Mn0.1Te晶体生长与深能级缺陷研究
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长安大学 材料科学与工程学院

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中图分类号:

TG145; TN304; O77+1; O782+.1

基金项目:

陕西省重点研发计划﹣国际科技合作项目:编号2020KWZ-008


Growth and Deep Level Defects of V-doped Cd0.9Mn0.1Te Crystal
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1.School of Materials Science and Engineering,Chang''an University,Xi''an 710061;2.China

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    摘要:

    CdMnTe(碲锰镉)材料作为新一代的半导体材料,在核辐射探测领域具有很高的应用价值。本文采用Te溶液垂直布里奇曼法生长Cd0.9Mn0.1Te: V晶体,研究其光电性能及深能级缺陷的分布。紫外-可见-近红外光谱分析表明晶锭中部和尾部的禁带宽度分别为1.602 eV和1.598 eV。光致发光谱中,晶体的(D0,X)峰形尖锐,半峰宽较小,表明缺陷或杂质含量低,晶体质量好。室温I-V测试晶锭中部和尾部晶体电阻率分别为2.85×1010 Ω?cm和9.54×109 Ω?cm,漏电流分别为3 nA和8.5 nA。霍尔测试表明晶体导电类型为n型。通过热激电流谱研究了Cd0.9Mn0.1Te: V晶体中缺陷的能级和浓度,其中晶锭中部和尾部样品中源于Te反位(Te2+ Cd)的深施主能级(EDD)的值分别为0.90 eV和0.812 eV。并且深施主能级EDD使费米能级位于禁带中央,从而使晶体呈现高电阻率。

    Abstract:

    As a new generation of semiconductor materials, CdMnTe material has high application value in the field of nuclear radiation detection. In this paper, Te solution vertical Bridgman method was used to grow Cd0.9Mn0.1Te: V crystal to study the optical and electrical properties and the distribution of deep-level defects of the Cd0.9Mn0.1Te: V crystal. UV-VIS-NIR spectroscopy analysis shows that the band gap in the middle and tail of the ingot is 1.602 eV and 1.598 eV. The photoluminescence spectral analysis shows that the (D0,X) peak of the crystal is sharp and the half-width is small, indicating that the defect or impurity content is low and the crystal quality is superior. The room temperature I-V test, shows that the resistivities of the middle and tail crystals are 2.85×1010 Ω?cm and 9.54×109 Ω?cm, and leakage currents 3 nA and 8.5 nA, respectively. The Hall test shows that the conductivity type of the crystal is n-type. The energy of the trap peak and the defect concentration in the Cd0.9Mn0.1Te: V crystal are studied by heat induced current spectroscopy. The values of the deep donor levels (EDD) derived from the Te2+ Cd in the middle and tail samples of the ingot are 0.90 eV and 0.812 eV, respectively. Does the deep donor level EDD make the Fermi level in the center of the forbidden band and thus to present a high resistivity.

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游思伟,艾涛,栾丽君.钒掺杂Cd0.9Mn0.1Te晶体生长与深能级缺陷研究[J].稀有金属材料与工程,2022,51(5):1873~1878.[You Siwei, Ai Tao, Luan Lijun. Growth and Deep Level Defects of V-doped Cd0.9Mn0.1Te Crystal[J]. Rare Metal Materials and Engineering,2022,51(5):1873~1878.]
DOI:10.12442/j. issn.1002-185X.20210486

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历史
  • 收稿日期:2021-06-02
  • 最后修改日期:2021-09-26
  • 录用日期:2021-09-27
  • 在线发布日期: 2022-06-09
  • 出版日期: 2022-05-30