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磁控溅射WSx/W/DLC/W多层膜的微观结构及摩擦学性能
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浙江工业大学 材料科学与工程学院

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TH117.1

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浙江省自然科学基金资助(项目号LY15E010007)


Microstructure and tribological behavior of magnetron sputtered WSx/W/DLC/W multilayer films
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College of Materials Science and Engineering,Zhejiang University of Technology

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    摘要:

    采用磁控溅射技术在硅基底上交替沉积WSx、W以及DLC膜层制备WSx/W/DLC/W多层膜。利用X射线衍射仪、扫描电镜、纳米压痕仪等对多层膜的微观结构和力学性能进行了表征,使用球盘式摩擦磨损试验机测试了多层膜在大气中的摩擦学性能。结果表明:多层膜表面均光滑致密。随着周期中W单层厚度的增加,多层膜中出现α-W、W2C和 β-WC1-x结晶相,多层膜的硬度大幅提高(6 nm时具有极大值17.3 GPa),摩擦因数呈下降趋势,结合力逐渐降低,磨损率先降低后升高。W单层厚度为6 nm的多层膜的耐磨性能最佳,磨损率约为1.4×10-14 m3N-1m-1。

    Abstract:

    WSx/W/DLC/W multilayer films were prepared by using magnetron sputtering technique and alternate deposition of WSx, W and diamond-like carbon (DLC) layers on silicon substrates. The microstructure, mechanical properties and tribological behaviors in the atmosphere of the films were characterized by X-ray diffractometry, scanning electron microscopy, nano-indenter and ball-on-disk wear tester. The results show that the surface of all the multilayer films is smooth and dense. As the thickness of single W interlayer increases in the modulation period, α-W, W2C, and β-WC1-x crystalline phases are formed in the multilayer films. The hardness of the multilayer films is greatly improved (up to 17.3 GPa at single W interlayer thickness of 6 nm), the friction coefficient shows a downward trend, the adhesion to the substrate is gradually reduced and the wear rate decreases first and then increases. The multilayer film with single W interlayer thickness of 6 nm exhibits the best wear resistance, its wear rate is about 1.4×10-14 m3N-1m-1.

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郑晓华,刘涛,杨烁妍,王贡启,杨芳儿.磁控溅射WSx/W/DLC/W多层膜的微观结构及摩擦学性能[J].稀有金属材料与工程,2020,49(4):1295~1300.[Zheng Xiao-hua, Liu Tao, Yang Shuo-yan, Wang Gong-qi, Yang Fang-er. Microstructure and tribological behavior of magnetron sputtered WSx/W/DLC/W multilayer films[J]. Rare Metal Materials and Engineering,2020,49(4):1295~1300.]
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  • 收稿日期:2019-05-06
  • 最后修改日期:2019-10-03
  • 录用日期:2019-10-14
  • 在线发布日期: 2020-05-07
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