程晓敏,李佐宜,王建平.共溅射与多层膜溅射制备FePt:Ag颗粒膜的微观结构比较[J].稀有金属材料与工程,2005,34(12):1879~1881.[.Microstructure Comparison between Co-Sputtered and Multilayer-Sputtered FePt:Ag Granular Thin Films[J].Rare Metal Materials and Engineering,2005,34(12):1879~1881.]
共溅射与多层膜溅射制备FePt:Ag颗粒膜的微观结构比较
投稿时间:2004-03-29  修订日期:2004-09-21
中文关键词:  FePt:Ag颗粒膜 微观结构 共溅射 多层膜溅射
基金项目:
中文摘要:
      采用共溅射和多层膜溅射两种不同的溅射方式制备FePt:Ag颗粒膜。MFM和TEM微观结构观测的结果表明:与多层膜溅射制备的FePt:Ag颗粒膜相比,共溅射制备的颗粒膜具有更小的磁畴尺寸和晶粒尺寸,并且其磁畴和晶粒的分布更加均匀。这种微观结构上的区别可解释为共溅射制备的颗粒膜中Ag原子的分布更加具有随机性。对薄膜内部缺陷的研究进一步证实了该解释。
Microstructure Comparison between Co-Sputtered and Multilayer-Sputtered FePt:Ag Granular Thin Films
英文关键词:FePtAg granular films  microstructure  co-sputtering  multilayer-sputtering
英文摘要:
      Two different sputtering modes, co-sputtering and multilayer-sputtering, were used to fabricate FePt:Ag granular thin films. It is observed by the MFM and TEM images that smaller magnetic domain patterns and grains are more uniformly distributed in the co-sputtered granular films compared to in multilayer-sputtered ones. This difference in the microstructure is explained to be attributed to the more randomly distributed Ag atoms in the co-sputtered films. Further study on in-depth defects in these films confirms this explanation.
程晓敏  李佐宜  王建平
[1]华中科技大学,湖北武汉430074 [2]新加坡数据存储研究所,新加坡117608
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