Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor

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Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor
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[. Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor[J]. Rare Metal Materials and Engineering,2007,36(12):2075~2079.]
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