Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor

Home > Archive>Volume 36, Issue 12, 2007 >2075-2079

Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor
DOI:
                        
                    
Author:
                        

Find this author on All Journals
Find this author on BaiDu
Search for this author on this site

                    
Affiliation:
Clc Number:TG154.5
Fund Project:

Article

Figures

Metrics

Reference

Cited by

Materials

Comments

Get Citation

[. Recent Progress in Preparation of Ta2O5 Film by CVD Using Ta(OC2H5)5 as Precursor[J]. Rare Metal Materials and Engineering,2007,36(12):2075~2079.]
DOI：[doi]

Copy

Article Metrics

Abstract:
PDF:
HTML:
Cited by:

History

Received:
Revised:January 09,2007
Adopted:
Online:
Published:

Home

Introduction

Editorial Board

Submission Guideline

Contact Us

中文

Get Citation

Article Metrics

History